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CORE COMPETENCE

Metrology

As an ISO 9001:2015 certified company, LIWANOPTICS provides products with high quality and reliability to our customers basing on stringent quality control and manufacturing process discipline.
LIWANOPTICS owns excellent inspection team which are asked inspect 100% of all optics. Test data is provided with prototype orders.
High precision optical and mechanical metrology enables MLOptic to adhere to tight tolerances and ensure customer satisfaction.

Interferometer-Surface Form Metrology

Optics Manufacturing
Interferometer zygo Verifire XP/Z
  • Interferometric measurements for s and p polarization (Internal Zygo polarizator option). For polarization sensitive optics, such as laser crystals, waveplates and polarizers.                          
  • Clear aperture up to 101.6 mm.
  • Zygo transmission-/reference flats (< λ/20@632.8 nm) for surface flatness (PV/power/irregularity/RMS), wavefront distortion and parallelism measurements.
  • Zygo f/0.75, f/1.5, f/3.3, f/10.7 transmission/reference spheres
    (< λ/20@632.8 nm) and“Renishaw”guide rail (1500 mm) for radius metrology to test spherical surfaces for form irregularities, wavefront distortion, and Radius of Curvature with the radius of ±4 nm–±800 mm.

Eccentric measurement

  • Industry-standard single lens and bonded lens can be directly measured for eccentricity angle with high precision – with a vernier scale of 0.001mm, wide grid reading for large scale, achieving measurement accuracy of up to 5 seconds. It has a wide measurement range and can measure not only flat mirrors but also convex and concave lenses (including non-spherical ones).
  • Measurement – Suitable for measuring the coaxiality deviation between the optical lens spherical optical axis and the outer circle.
  • Bonding lens centering – Centering of two or more lenses bonded together.
  • Assembly eccentricity correction – Eccentricity correction during the assembly process of optical components.
Multi-function test station

Optical automatic centering bonding system

Fully automated optical lens bonding station
  • The fully automatic optical lens bonding system is specifically designed to achieve fully automatic lens bonding, with functions such as center deviation measurement, automatic adjustment alignment, and automatic bonding.
  • This system is based on the principle of “threading” and can be extended on any center deviation measuring instrument equipped with an air bearing turntable.
  • Bonding accuracy :1 μm.
  • Alignment adjustment time:30 seconds.

spectrophotometer – coating curve metrology

UV-visible-near-infrared spectrophotometer  
  • PerkinElmer Spectrum.
  • Spectral range within 185 nm–3300 nm.
  • Polarization measurements within 220 nm–3300 nm.
  • Installing three detectors, standard with an integrating sphere.
  • Resolution: 0.1 nanometers.
Infrared fourier spectrometer
  • The main sample chamber is equipped with three detectors.
  • High-resolution.
  • Validation wheel.
  • Fully gold-coated optical components (standard, aluminum-coated optical components available).
  • Resolution: 0.1 nanometers.

Scanning electron microscopy and energy spectrum analysis

HITACHI SEM&EDS for thin film
  • Thickness Measurement: SEM with EDS analyzes elemental distribution for precise determination of thin film thickness.

  • Structural Observation: SEM examines surface and cross-sectional morphology, aiding in optimizing coating processes.

  • Composition Analysis: EDS rapidly determines elemental composition and distribution in thin films.

  • Defect Analysis: SEM/EDS identifies defects, contributing to the assessment of film quality and stability.

  • Interface Analysis: For composite films, SEM/EDS provides data on morphology and composition, facilitating the study of interface properties.

Analysis of Surface Roughness

LiwanOptics
Bruker AFM Dimension Icon
  • Surface Morphology Analysis: AFM provides high-resolution observation of the surface morphology of optical lenses, including surface roughness and particle distribution, aiding in optimizing manufacturing processes and enhancing optical performance. 
  • Thin Film Thickness Measurement: For thin films coated on optical lenses, AFM accurately measures film thickness, crucial for ensuring optical performance.
  • Thin Film Structural Analysis: AFM reveals structural features of thin films, such as particle distribution and defects, assisting in understanding their formation mechanisms and performance.

Analysis of optical constants of film layers

J.A.Woollam Ellipsometer M-2000V
  • Spectral range: 370-1000nm, with 390 data points.
  • Measurement time: Fastest at 0.05s; typically 1 to 5s (for the full spectral range of 370-1000nm).
  • Angle of incidence: Fixed at 65 degrees.
  • Sample stage size: 150mm horizontal sample stage, with automatic Z-axis height adjustment.
  • Spot size: Normal spot diameter around 4mm, micro spot diameter 220μm.

Used for measuring the thickness (d) of single or multiple layers of thin films; measurement of optical constants of individual or multiple layers of thin films, such as refractive index (n) and extinction coefficient (k).

system design

We can develop complex optical svstem desins according to your appicaion reuirements. We take into acount allthe steps during the desin phase, such asproduction and coating technologies.

  • Provide support in developing specifications (such as sample test, comparing experiments and so on)
  • Provide optical, mechanical desians and coating desian also.
  • Provide tolerance analysis to predict production performance
  • Provide desian review for you.
  • Production and assembly supported.

Optical Design

Laser beam expansion
Telephoto
Microscopic objective
wide-angle lens
Infrared lens
Projection Lens

Coating Design

355/532/1064nm high-power laser
long-wave-pass
Short-wave-pass
high reflection
Narrowband filtering
Neutral Density

Structure Design

Coating types

Highly reflective

Anti-reflective

Partially reflective

Wavelength separating

Broadband coatings

Polarizing coatings

Preferred coating technology

Ion Assisted E-Beam

Ion assisted electron beam evaporation  is an excellent solution for mass production which produces excellent coatings at extremely competitive deposition rates for a broad range of applications and wavelengths.

  • Minimum reflectance <0.1%
  • Maximum reflectance >99.99%
  • Extinction ratio 1:1000

Customized according to demand

  • 220-3000 nm
  • Al2O3, HfO2, Nb2O5, SiO2, Ta2O5, TiO
  • Materials mixture
  • Ag,Au,Al,Rh,Cr,Ti
  • MgF2, LaF(without IAD)

RF ion source and Application field cases

The coating system of Liwan Optics adopts an RF radio frequency ion source auxiliary system to prepare high loss threshold laser films and high stability films

High power lasers have a very high instantaneous power density and a small pulse width, causing damage and destruction to thin film components through nonlinear effects caused by strong electric fields. LIWANOPTICS avoids the increase of peak field strength and the generation of nodule defects through the high film-forming quality of RF ion sources and precise film thickness control.

UV Bandpass Filter: The Essential Component for Optical Applications

Initial nodule defects and enlargement of damage spots

High Laser damage threshold film